OVERVIEW

Sputtering Systems

Configuration Overview

AJA offers HV and UHV magnetron sputtering systems for research scale physical vapor deposition ranging from compact (Orion Series) to complex (ATC Series) plus small batch coaters (Batch Series). These sputtering systems can be configured in either con-focal, normal incidence, off-axis, glancing angle, or combination of target to substrate orientations. Substrate holder features include radiant heating (1000°C), azimuthal rotation, RF/DC biasing, z-motion, cooling (H2O or LN2), tilting, or planetary motion.

Orion Series

Compact Systems

  • Price range: $125,000 - $350,000

  • 14" chamber Ø

  • 1”, 1.5", 2" and 3" sputter sources

  • Substrate holders up to 6" Ø

  • Load-lock and cassette options

  • Auto-loading

  • Computer control

ATC Series

Flagship Systems

  • Price Range: $175,000 - $950,000+

  • 18" to 34" chamber Ø

  • 1" to 8" diameter sputter sources

  • In-situ tilt source option

  • Substrate holders to 12" Ø

  • Load-lock and cassette options

  • Auto-loading & Computer Control

Batch Series

Batch Coating Systems

  • Price range: $150,000 - $850,000+

  • Cylindrical or box style chambers

  • Load-lock & cassette options

  • Circular, triangular or linear sputtering sources

  • Integrated hoist or hinged door

  • Single, multi-layer or co-deposition

  • Substrate heating, H2O cooling, RF biasing / Ion source cleaning