HV & UHV
Sputtering Sources

AJA International, Inc. has developed well over 100 different types of magnetron sputtering sources since 1991 including many sources specifically designed for specialty applications. Unique rectangular, circular, turret and cylindrical versions are offered depending on the substrate geometries, chamber configurations, target material constraints and the desired film specification. See further details below or contact AJA about your requirements.

Unique Modular Magnet Array

AJA's magnetron sputtering sources feature a unique "modular magnet array" which is completely isolated from the cooling water to eliminate magnet deterioration and subsequent degradation of source performance. This design permits access to the internal magnet arrangement thus allowing the same source to be:

  • Changed for uniform or intentionally non-uniform depositions

  • Configured for high or low electron energies as they arrive at the substrate surface

  • Operated with thick magnetic material targets

  • Optimized for easy magnetic target removal and replacement

  • Operated as a balanced magnetron

  • Configured for maximum target utilization

  • Configured for high or low rate sputtering

  • Operated in a variety of unbalanced magnetron configurations

STILETTO SERIES

HV Circular & Rectangular Magnetron Sputtering Sources

The AJA Stiletto Series Circular Magnetron Sputtering Sources have been designed to meet the most challenging needs of the thin film research community for high vacuum applications while maintaining flexibility and features of the world class A300-XP Series UHV sources. Circular Target Stiletto Sources available in the following sizes:

  • ST10 : 1.0” target diameter

  • ST20: 2.0” target diameter

  • ST30: 3.0” target diameter

  • ST40: 4.0” target diameter

  • ST1550 : 1.5” x 5.00” rectangular target

  • ST1580 : 1.5” x 8.00” rectangular target

  • ST2056 : 2.0” x 5.63” rectangular target

  • ST2080 : 2.0” x 8.00” rectangular target

A300-XP SERIES

UHV Circular Magnetron Sputtering Sources

The AJA A300-XP UHV Magnetron Sputtering Sources are the next generation, "expanded performance" version of the industry standard A300 SERIES magnetron sputtering sources that have dominated the high end, UHV sputter gun market since 1991. New "expanded performance" features include higher pressure operation, improved magnetic material sputtering performance, and a larger product range. While our competitors have attempted to incorporate certain "AJA innovations" into their products, the new A300-XP source developments will continue to ensure AJA's position well ahead of the pack in the UHV magnetron market. Circular Target A300-XP Sources are available in the following sizes:

  • A330-XP: 3.0" Target Ø

  • A340-XP: 4.0" Target Ø

  • A360-XP: 6.0" Target Ø

  • A310-XP: 1.0" Target Ø

  • A315-XP: 1.5" Target Ø

  • A320-XP: 2.0" Target Ø